High-Vacuum Thin Film Deposition System
This high-vacuum coating system is designed for thin film deposition on glass and ceramic substrates. It features multiple deposition sources, precise process control, and automated operation.



Technical Specifications
Overview
High-Vacuum Thin Film Deposition System
This high-vacuum coating system is engineered specifically for precise thin film deposition on glass and ceramic substrates. It features a modular design that supports customization and expansion, making it highly adaptable for diverse applications in optics, electronics, and materials science. The system integrates advanced pumping technology to ensure high-quality, consistent film deposition, while automated operation and real-time monitoring provide precise control over all process parameters.
Technical Capabilities
Deposition Sources
- Multiple deposition sources
- Precise process control
- Vacuum Technology
- High-VacuumAdvanced Pumping
System Features
Design & Control
- Model Identifier
- F-14-14
Applications
Suitable Applications
- Optics
- Electronics
- Materials Science



